21–25 Feb 2027 · San Jose, CA, US
SPIE ADVANCED LITHOGRAPHY
Advanced Lithography Conference and Expo + Patterning. The event for emerging technology in the semiconductor industry
- Dates
- 21–25 Feb 2027
- Venue
- San Jose McEnery Convention Center
- Location
- San Jose, CA, US
- Frequency
- Annual
- Audience
- Mixed
- Duration
- 5 days
- Scale
- National
- Exhibitors
- 320Estimate · 40%
- Visitors
- 13,000Estimate · 30%
- Area
- 14,000 m²Estimate · 30%
Compiled from public sources and periodically reviewed and updated. This information is provided for general guidance only and may be incomplete or out of date — please verify all details directly with the organizer or venue before relying on them.
About SPIE ADVANCED LITHOGRAPHY
SPIE ADVANCED LITHOGRAPHY is a national trade fair for the Electronic Design & Components and Sciences for Engineers - Research & Development industries, taking place in San Jose, CA, United States. The 2027 edition runs 21–25 Feb 2027 at San Jose McEnery Convention Center. It brings together an estimated 320 exhibitors and an estimated 13,000 visitors.
Venue
San Jose McEnery Convention Center
San Jose, CA, California, US
Exhibitors
Related events
Frequently asked questions
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