8–11 Sep 2026 · Monterey, CA, US
SPIE PHOTOMASK TECHNOLOGY + EXTREME ULTRAVIOLET LITHOGRAPHY
Photo Mask Technology Exhibition. SPIE Photomask Technology + Extreme Ultraviolet Lithography is a highly regarded exhibition & conference for buyers and key suppliers of components, software, and manufacturing equipment for the mask industry
- Dates
- 8–11 Sep 2026
- Venue
- Monterey Conference Center
- Location
- Monterey, CA, US
- Frequency
- Annual
- Audience
- Mixed
- Duration
- 4 days
- Scale
- National
- Exhibitors
- 320Estimate · 40%
- Visitors
- 13,000Estimate · 30%
- Area
- 14,000 m²Estimate · 30%
Compiled from public sources and periodically reviewed and updated. This information is provided for general guidance only and may be incomplete or out of date — please verify all details directly with the organizer or venue before relying on them.
About SPIE PHOTOMASK TECHNOLOGY + EXTREME ULTRAVIOLET LITHOGRAPHY
SPIE PHOTOMASK TECHNOLOGY + EXTREME ULTRAVIOLET LITHOGRAPHY is a national trade fair for the Electronic Design & Components and Optoelectronics industries, taking place in Monterey, CA, United States. The 2026 edition runs 8–11 Sep 2026 at Monterey Conference Center. It brings together an estimated 320 exhibitors and an estimated 13,000 visitors.
Venue
Monterey Conference Center
Monterey, CA, California, US
Exhibitors
Related events
Frequently asked questions
When is SPIE PHOTOMASK TECHNOLOGY + EXTREME ULTRAVIOLET LITHOGRAPHY 2026?
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How many exhibitors does SPIE PHOTOMASK TECHNOLOGY + EXTREME ULTRAVIOLET LITHOGRAPHY have?
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