8–10 Apr 2027 · Yokohama, JP
PHOTOMASK JAPAN 2027
Photomask Japan 2025 is the 31st international symposium on photomasks and next-generation lithography (NGL) masks held in Yokohama, Japan. It brings together engineers and researchers from Japan, the USA and worldwide to present invited and contributed papers, poster sessions and panel discussions covering photomask materials, fabrication, metrology, EUV/NIL/FPD masks, e-beam tools, RET and related semiconductor patterning technologies. The event includes a technical exhibition and proceedings managed with SPIE involvement.
Last updated
- Dates
- 8–10 Apr 2027
- Location
- Yokohama, JP
- Frequency
- Annual
- Audience
- Trade
- Duration
- 3 days
- Scale
- International
- Visitors
- 624Fact
Compiled from public sources and periodically reviewed and updated. This information is provided for general guidance only and may be incomplete or out of date — please verify all details directly with the organizer or venue before relying on them.
About PHOTOMASK JAPAN 2027
PHOTOMASK JAPAN 2027 is an international trade show in Yokohama, Japan for the Electronics and Industrial & Manufacturing industries. The 2027 edition runs 8–10 Apr 2027 at Annex Hall, PACIFICO YOKOHAMA. It brings together 624 visitors (organizer-confirmed).
Known editions
- 20268–10 Apr 2026
Venue
Yokohama, Kanagawa Prefecture, JP
Exhibitors
Related events
Frequently asked questions
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